Mon 20th Jan 2003 | News
e-on software, makers of Vue d'Esprit 4 and Curious Labs, makers of Poser, announce their plans to continue future development for technology cooperation between e-on software Vue d'Esprit and the Poser products. To celebrate the plans for continued partnership, both companies will market a bundle offer of Vue 4 and Poser 4 for the special price of $320.
"Curious Labs' Poser 5 includes some amazing new technologies that are the delight of character artists and animators. We are committed to continue development that will allow our users to integrate Poser 5 with e-on software products; a combined solution that will allows artists to create and animate complex human and natural scenes in minutes," said Nicholas Phelps, President of e-on software. "Vue 4's fast and easy path motion and SolidGrowth plant technology make perfect environments for rendering in the natural world," said Katherine Howard, Curious Labs Vice President of Sales and Marketing, "The benefit of our continued partnership to integrate technologies of our software with e-on software will impact customers very positively."
Vue 4 is e-on software's unique and totally unequaled environment for 3D natural scenery rendering and animation. Vue 4 features ultra realistic vegetation, powerful volumetric lights and atmospheres, stellar objects, glowing materials, and a super-faster renderer. Create terrains in real-time with its Solid3D terrain modeler, then populate your world with Poser 4 people!
Vue d'Esprit 4 comes with 2 CDs, bursting with 30 SolidGrowth 2 tree and plants, over 100 atmospheres, 100 different types of clouds, 300 materials, 250 high quality fully textured 3D objects, 50 example scenes and a 360-page manual. Vue 4 by itself costs $199.
Mover 4 for Windows and Mac OS X expands on the already powerful animation in Vue d'Esprit 4, allowing for inclusion of fully animated digital characters, enhanced, new motion effects, and network rendering. Mover 4 is available for $99 and requires Poser 4 for Poser animation import and use of Poser models.